To perform high-precision inspections of structured surfaces, which are commonly used in e.g. the semiconductor industry, optical testing systems based on interference effects can be used. A full simulation of these setups needs to include all physical optical effects, like diffraction at the structure, coherence and the resulting interference at the image plane. To help the optical engineer in this task, the fast physical optics software VirtualLab Fusion offers a series of tools to include diffraction and non-sequential modelling in the system.
With the release of the new version 2023.1 we also provide a new detector concept which allows the user to calculate any physical quantity that might be of interest, directly from the field information. To see all these tools in action, we showcase two examples below. In the first one, a high-NA objective is used to inspect an asymmetric micro-structured wafer, while in the second example we show the irradiance patterns from a classical Fizeau interferometer using differently shaped test surfaces.
Optical System for Inspection of Micro-Structured Wafer
This use case shows the Fast Physical Optics simulation of a high-NA wafer inspection system that is commonly used in the semiconductor industry to detect defects on wafers.
A Fizeau interferometer is set up with the help of non-sequential field tracing technology, and the interference fringes from several different test surfaces are shown.
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Newsletter/News MIC.0023, Wafer, Wafer Inspection, High-NA, High-NA System, Lens Component, Grating Component, Beam Splitter, Beam Splitter Component, Objective Lens, Lens, Objective, High-NA Lens, k-domain sampling, angular response, IFO.0009, Fizeau Interferometer, Optical Testing, non-sequential, interferometry, Fizeau, interferometer, interference, manual configuration, metrology, wavefront
To help the optical engineer in this task, VirtualLab Fusion offers a series of tools to include diffraction and non-sequential modelling in the system.